Publication:

Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

Date

2017
Proceedings Paper
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dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPaolillo, Sara
dc.contributor.authorPeter, Antony
dc.contributor.authorDe Roest, David
dc.contributor.authorSeong, TaeGeun
dc.contributor.authorWu, Yizhi
dc.contributor.authorDecoster, Stefan
dc.contributor.authorRutigliani, Vito
dc.contributor.authorLorusso, Gian
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorPiumi, Daniele
dc.contributor.authorBarla, Kathy
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-24T07:34:24Z
dc.date.available2021-10-24T07:34:24Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28769
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2258040
dc.source.beginpage101460K
dc.source.conferenceAdvances in Patterning Materials and Processes XXXIV
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

dc.typeProceedings paper
dspace.entity.typePublication
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