Publication:
The influence of the interface trap densities on the extraction of the silicon film and front oxide thickness of SOI NMOS devices at low temperatures
Date
| dc.contributor.author | Nicolett, A.S. | |
| dc.contributor.author | Martino, J.A. | |
| dc.contributor.author | Simoen, Eddy | |
| dc.contributor.author | Claeys, Cor | |
| dc.contributor.imecauthor | Simoen, Eddy | |
| dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
| dc.date.accessioned | 2021-10-14T22:32:30Z | |
| dc.date.available | 2021-10-14T22:32:30Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6645 | |
| dc.source.beginpage | 28 | |
| dc.source.conference | Proceedings of the 17th International Symposium on Microelectronics Technology and Devices - SBMICRO | |
| dc.source.conferencedate | 9/09/2002 | |
| dc.source.conferencelocation | Porto Allegre Brazil | |
| dc.source.endpage | 34 | |
| dc.title | The influence of the interface trap densities on the extraction of the silicon film and front oxide thickness of SOI NMOS devices at low temperatures | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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