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Approach for a standardized methodology for multisite processing of 300-mm wafers at R&D sites
Publication:
Approach for a standardized methodology for multisite processing of 300-mm wafers at R&D sites
Date
2007
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Oechsner, Richard
;
Pfeffer, M.
;
Frickinger, J.
;
Schellenberger, M.
;
Roeder, G.
;
Pfitzner, L.
;
Ryssel, H.
;
Fritzsche, M.
;
Kaushik, V.
;
Renaud, D.
;
Danel, A.
;
Claeys, Cor
;
Bearda, Twan
;
Lering, M.
;
Graef, M.
;
Murphy, B.
;
Walther, H.
;
Hury, S.
Journal
IEEE Trans. Semiconductor Manufacturing
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1931
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1931
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations