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Correlation between the l/f noise parameters and the effective low-field mobility in HfO2 gate dielectric n-channel metal-oxide-semiconductor field-effect transistors
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Correlation between the l/f noise parameters and the effective low-field mobility in HfO2 gate dielectric n-channel metal-oxide-semiconductor field-effect transistors
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Date
2004
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Simoen, Eddy
;
Mercha, Abdelkarim
;
Claeys, Cor
;
Young, E.
Journal
Applied Physics Letters
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1977
since deposited on 2021-10-15
1
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Acq. date: 2025-12-11
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Views
1977
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-11
Citations