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Successes and challenges for the electrical performance of high-k gate dielectrics in future CMOS applications
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Successes and challenges for the electrical performance of high-k gate dielectrics in future CMOS applications
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Date
2003
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Groeseneken, Guido
Journal
Abstract
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1834
since deposited on 2021-10-15
Acq. date: 2025-12-15
Citations
Metrics
Views
1834
since deposited on 2021-10-15
Acq. date: 2025-12-15
Citations