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Material studies on Si:C epitaxial films grown by CVD

Date

2014-10
Proceedings Paper
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dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorLoo, Roger
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorShimura, Yosuke
dc.contributor.authorNuytten, Thomas
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-22T01:17:29Z
dc.date.available2021-10-22T01:17:29Z
dc.date.embargo9999-12-31
dc.date.issued2014-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23766
dc.identifier.urlhttp://ecst.ecsdl.org/content/64/6/997.abstract
dc.source.beginpage997
dc.source.conferenceSiGe, Ge, and Related Compounds 6: Materials, Processing, and Devices
dc.source.conferencedate5/10/2014
dc.source.conferencelocationCancun Mexico
dc.source.endpage1005
dc.title

Material studies on Si:C epitaxial films grown by CVD

dc.typeProceedings paper
dspace.entity.typePublication
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