Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applications

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Author(s)

Florent, Karine

;

Lavizzari, Simone

;

Di Piazza, Luca

;

Popovici, Mihaela Ioana

;

Groeseneken, Guido

;

Journal

IEEE Transactions on Electron Devices

Metrics

1957 since deposited on 2021-10-24

Acq. date: 2025-10-23