Publication:
Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applications
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1961 since deposited on 2021-10-24
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Acq. date: 2026-01-10
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1961 since deposited on 2021-10-24
1last month
1last week
Acq. date: 2026-01-10
Citations