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Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applications
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1960 since deposited on 2021-10-24
3last month
Acq. date: 2025-12-12
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Metrics
Views
1960 since deposited on 2021-10-24
3last month
Acq. date: 2025-12-12
Citations