Publication:
Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applications
Date
| dc.contributor.author | Florent, Karine | |
| dc.contributor.author | Lavizzari, Simone | |
| dc.contributor.author | Di Piazza, Luca | |
| dc.contributor.author | Popovici, Mihaela Ioana | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.author | Van Houdt, Jan | |
| dc.contributor.imecauthor | Di Piazza, Luca | |
| dc.contributor.imecauthor | Popovici, Mihaela Ioana | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.contributor.imecauthor | Van Houdt, Jan | |
| dc.contributor.orcidimec | Groeseneken, Guido::0000-0003-3763-2098 | |
| dc.contributor.orcidimec | Van Houdt, Jan::0000-0003-1381-6925 | |
| dc.date.accessioned | 2021-10-24T04:45:35Z | |
| dc.date.available | 2021-10-24T04:45:35Z | |
| dc.date.issued | 2017 | |
| dc.identifier.issn | 0018-9383 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28340 | |
| dc.identifier.url | http://ieeexplore.ieee.org/document/8023826/ | |
| dc.source.beginpage | 4091 | |
| dc.source.endpage | 4098 | |
| dc.source.issue | 10 | |
| dc.source.journal | IEEE Transactions on Electron Devices | |
| dc.source.volume | 64 | |
| dc.title | Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applications | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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