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Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars
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Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars
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Date
2021
Journal article
https://doi.org/10.1016/j.mne.2021.100082
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pak, Murat
;
Zanders, Wesley
;
Wong, Patrick
;
Halder, Sandip
Journal
MICRO AND NANO ENGINEERING
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555
since deposited on 2022-02-22
62
last month
18
last week
Acq. date: 2025-12-16
Views
1805
since deposited on 2022-02-22
1
last month
Acq. date: 2025-12-16
Citations