Publication:

Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars

Date

2021
Journal article
https://doi.org/10.1016/j.mne.2021.100082
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dc.contributor.authorPak, Murat
dc.contributor.authorZanders, Wesley
dc.contributor.authorWong, Patrick
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorPak, Murat
dc.contributor.imecauthorZanders, Wesley
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2022-02-22T08:48:19Z
dc.date.available2022-02-22T08:48:19Z
dc.date.issued2021
dc.identifier.doi10.1016/j.mne.2021.100082
dc.identifier.issn2590-0072
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38975
dc.publisherELSEVIER
dc.source.beginpage100082
dc.source.issuena
dc.source.journalMICRO AND NANO ENGINEERING
dc.source.numberofpages7
dc.source.volume10
dc.title

Screening of 193i and EUV lithography process options for STT-MRAM orthogonal array MTJ pillars

dc.typeJournal article
dspace.entity.typePublication
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