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Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry
Publication:
Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry
Date
2021-01-27
Journal article
https://doi.org/10.1126/sciadv.abd9667
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tanksalvala, Michael
;
Porter, Christina L.
;
Esashi, Yuka
;
Wang, Bin
;
Jenkins, Nicholas W.
;
Zhang, Zhe
;
Miley, Galen P.
;
Knobloch, Joshua L.
;
McBennett, Brendan
;
Horiguchi, Naoto
;
Yazdi, Sadegh
;
Zhou, Jihan
;
Jacobs, Matthew N.
;
Bevis, Charles S.
;
Karl, Robert M., Jr.
;
Johnsen, Peter
;
Ren, David
;
Waller, Laura
;
Adams, Daniel E.
;
Cousin, Seth L.
;
Liao, Chen-Ting
;
Miao, Jianwei
;
Gerrity, Michael
;
Kapteyn, Henry C.
;
Murnane, Margaret M.
Journal
SCIENCE ADVANCES
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Downloads
341
since deposited on 2021-11-02
5
last week
Acq. date: 2025-11-02
Views
1679
since deposited on 2021-11-02
2
last week
Acq. date: 2025-11-02
Citations