Publication:

Atomic layer deposition of GdHfOx thin films

Date

2009
Proceedings Paper
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dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPierreux, Dieter
dc.contributor.authorSwerts, Johan
dc.contributor.authorRosseel, Erik
dc.contributor.authorShi, Xiaoping
dc.contributor.authorTielens, Hilde
dc.contributor.authorKesters, Jurgen
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-17T21:17:10Z
dc.date.available2021-10-17T21:17:10Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14870
dc.identifier.urlhttp://dx.doi.org/10.1149/1.3205059
dc.source.beginpage243
dc.source.conferenceAtomic Layer Deposition Applications 5
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage251
dc.title

Atomic layer deposition of GdHfOx thin films

dc.typeProceedings paper
dspace.entity.typePublication
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