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Study of EUV resist outgassing/contamination for device integration using EUVL processes
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Study of EUV resist outgassing/contamination for device integration using EUVL processes
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Date
2010
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20833.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pollentier, Ivan
Journal
Journal of Photopolymer Science and Technology
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1811
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Acq. date: 2025-12-15
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Views
1811
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-15
Citations