Publication:

Study of EUV resist outgassing/contamination for device integration using EUVL processes

Date

2010
Journal article
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dc.contributor.authorPollentier, Ivan
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-18T20:23:18Z
dc.date.available2021-10-18T20:23:18Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17817
dc.source.beginpage605
dc.source.endpage612
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume23
dc.title

Study of EUV resist outgassing/contamination for device integration using EUVL processes

dc.typeJournal article
dspace.entity.typePublication
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