Publication:

Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence.

Date

2004

Proceedings Paper

Simple item page Full metadata Statistics

Author(s)

Van Aelst, Joke

;

Baklanov, Mikhaïl

;

;

Struyf, Herbert

;

Boullart, Werner

;

Vanhaelemeersch, Serge

Statistics

1911 since deposited on 2021-10-15

Acq. date: 2026-02-24