Publication:
Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence.
Date
| dc.contributor.author | Van Aelst, Joke | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Le, Quoc Toan | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Van Aelst, Joke | |
| dc.contributor.imecauthor | Le, Quoc Toan | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-10-15T16:46:40Z | |
| dc.date.available | 2021-10-15T16:46:40Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9702 | |
| dc.source.conference | International Symposium on Dry Process - DPS | |
| dc.source.conferencedate | 30/11/2004 | |
| dc.source.conferencelocation | Tokyo Japan | |
| dc.title | Minimizing plasma damage of CVD low-k materials by tuning a two step etch sequence. | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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