Publication:

Impact of an etched EUV mask black border on imaging and overlay

Date

2012
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorde Kruif, Rob
dc.contributor.authorDavydova, Natalia
dc.contributor.authorConnolly, Brid
dc.contributor.authorFukugami, Norihito
dc.contributor.authorLammers, Ad
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKondo, Shinpei
dc.contributor.authorVan Setten, Eelco
dc.contributor.authorVaenkatesan, Vidya
dc.contributor.authorZimmerman, John
dc.contributor.authorHarned, Noreen
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-20T10:32:02Z
dc.date.available2021-10-20T10:32:02Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20547
dc.identifier.urlhttps://www.sematech.org/10258
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate1/10/2012
dc.source.conferencelocationBrussels Belgium
dc.title

Impact of an etched EUV mask black border on imaging and overlay

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations