Publication:

Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles

Date

2002
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dc.contributor.authorXu, Kaidong
dc.contributor.authorVos, Rita
dc.contributor.authorVereecke, Guy
dc.contributor.authorLux, Marcel
dc.contributor.authorFyen, Wim
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-15T00:04:57Z
dc.date.available2021-10-15T00:04:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7067
dc.source.conferenceUCPSS - Ultra Clean Processing Technology Symposium
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
dc.title

Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles

dc.typeOral presentation
dspace.entity.typePublication
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