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Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector
Publication:
Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector
Date
2021
Journal article
https://doi.org/10.1039/d0ma01014f
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Haider, Ali
;
Deng, Shaoren
;
Devulder, Wouter
;
Maes, Jan Willem
;
Girard, Jean-Marc
;
Khalil El Hajjam, Gabriel
;
Kar, Gouri Sankar
;
Opsomer, Karl
;
Detavernier, Christophe
;
Givens, Michael
;
Goux, Ludovic
;
Van Elshocht, Sven
;
Delhougne, Romain
;
Delabie, Annelies
;
Caymax, Matty
;
Swerts, Johan
;
Khalil
Journal
MATERIALS ADVANCES
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269
since deposited on 2022-02-22
Acq. date: 2025-10-23
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2028
since deposited on 2022-02-22
Acq. date: 2025-10-23
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269
since deposited on 2022-02-22
Acq. date: 2025-10-23
Views
2028
since deposited on 2022-02-22
Acq. date: 2025-10-23
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