Publication:

Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector

Date

2021
Journal article
https://doi.org/10.1039/d0ma01014f
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dc.contributor.authorHaider, Ali
dc.contributor.authorDeng, Shaoren
dc.contributor.authorDevulder, Wouter
dc.contributor.authorMaes, Jan Willem
dc.contributor.authorGirard, Jean-Marc
dc.contributor.authorKhalil El Hajjam, Gabriel
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorOpsomer, Karl
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorGivens, Michael
dc.contributor.authorGoux, Ludovic
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelhougne, Romain
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorSwerts, Johan
dc.contributor.authorKhalil
dc.contributor.imecauthorHaider, Ali
dc.contributor.imecauthorDevulder, Wouter
dc.contributor.imecauthorKhalil El Hajjam, Gabriel
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorDetavernier, Christophe
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorSwerts, Johan
dc.contributor.orcidimecDevulder, Wouter::0000-0002-5156-0177
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2022-02-22T13:15:35Z
dc.date.available2022-02-22T13:15:35Z
dc.date.issued2021
dc.identifier.doi10.1039/d0ma01014f
dc.identifier.issn2633-5409
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39005
dc.publisherROYAL SOC CHEMISTRY
dc.source.beginpage1635
dc.source.endpage1643
dc.source.issue5
dc.source.journalMATERIALS ADVANCES
dc.source.numberofpages9
dc.source.volume2
dc.subject.keywordsATOMIC LAYER DEPOSITION
dc.subject.keywordsALKYLSILYL COMPOUNDS
dc.subject.keywordsLIGAND-EXCHANGE
dc.subject.keywords((CH3)(3)SI)(2)TE
dc.subject.keywordsTELLURIUM
dc.subject.keywordsGETE
dc.subject.keywordsFILM
dc.subject.keywordsSB
dc.title

Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector

dc.typeJournal article
dspace.entity.typePublication
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