Publication:
Characterisation of porous low dielectric constant films by ellipsometric porosimetry
Date
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Mogilnikov, K. P. | |
| dc.date.accessioned | 2021-10-14T16:36:37Z | |
| dc.date.available | 2021-10-14T16:36:37Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5035 | |
| dc.source.beginpage | 219 | |
| dc.source.endpage | 221 | |
| dc.source.journal | Semiconductor Fabtech | |
| dc.source.volume | 14 | |
| dc.title | Characterisation of porous low dielectric constant films by ellipsometric porosimetry | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |