Publication:

TCAD strain calibration versus nanobeam diffraction of source/drain stressors for Ge MOSFETs

Date

2015

Journal article

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Author(s)

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Witters, Liesbeth

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Vincent, Benjamin

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Hikavyy, Andriy

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Collaert, Nadine

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Journal

IEEE Transactions on Electron Devices

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Acq. date: 2026-02-24