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Inelastic X-ray Scattering Measurement on Single-Crystalline GeSn Thin Film

 
dc.contributor.authorChino, M.
dc.contributor.authorYokogawa, R.
dc.contributor.authorOgura, A.
dc.contributor.authorUchiyama, H.
dc.contributor.authorTatsuoka, H.
dc.contributor.authorShimura, Yosuke
dc.contributor.imecauthorShimura, Yosuke
dc.contributor.orcidimecShimura, Yosuke::0000-0002-1944-9970
dc.date.accessioned2023-11-03T09:10:09Z
dc.date.available2023-05-22T20:15:46Z
dc.date.available2023-11-03T09:10:09Z
dc.date.embargo9999-12-31
dc.date.issued2023
dc.description.wosFundingTextAcknowledgmentsThis study was supported by JSPS KAKENHI (Grant No. JP21K04137) from the Japan Society for the Promotion of Science. The IXS measurements were performed at the SPring-8 facility with the approval of the JASRI (Proposal No. 2021B1203). Ge1-xSnx single-crystalline thin films used for the IXS measurements in this study were fabricated by IMEC.
dc.identifier.doi10.1007/s11664-023-10421-x
dc.identifier.issn0361-5235
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41609
dc.publisherSPRINGER
dc.source.beginpage5218
dc.source.endpage5133
dc.source.issue8
dc.source.journalJOURNAL OF ELECTRONIC MATERIALS
dc.source.numberofpages6
dc.source.volume52
dc.subject.keywordsGROWTH
dc.title

Inelastic X-ray Scattering Measurement on Single-Crystalline GeSn Thin Film

dc.typeJournal article
dspace.entity.typePublication
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