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Articles
Towards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric
Publication:
Towards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wu, Chen
;
Li, Yunlong
;
Ciofi, Ivan
;
Kauerauf, Thomas
;
Boemmels, Juergen
;
De Wolf, Ingrid
;
Tokei, Zsolt
;
Croes, Kristof
Journal
Journal of Applied Physics
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1789
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations
Metrics
Views
1789
since deposited on 2021-10-23
Acq. date: 2025-12-16
Citations