Towards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric

dc.contributor.author	Wu, Chen
dc.contributor.author	Li, Yunlong
dc.contributor.author	Ciofi, Ivan
dc.contributor.author	Kauerauf, Thomas
dc.contributor.author	Boemmels, Juergen
dc.contributor.author	De Wolf, Ingrid
dc.contributor.author	Tokei, Zsolt
dc.contributor.author	Croes, Kristof
dc.contributor.imecauthor	Wu, Chen
dc.contributor.imecauthor	Li, Yunlong
dc.contributor.imecauthor	Ciofi, Ivan
dc.contributor.imecauthor	Boemmels, Juergen
dc.contributor.imecauthor	De Wolf, Ingrid
dc.contributor.imecauthor	Tokei, Zsolt
dc.contributor.imecauthor	Croes, Kristof
dc.contributor.orcidimec	Wu, Chen::0000-0002-4636-8842
dc.contributor.orcidimec	Li, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimec	Ciofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimec	De Wolf, Ingrid::0000-0003-3822-5953
dc.contributor.orcidimec	Croes, Kristof::0000-0002-3955-0638
dc.date.accessioned	2021-10-23T01:06:59Z
dc.date.available	2021-10-23T01:06:59Z
dc.date.issued	2015
dc.identifier.issn	0021-8979
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/26188
dc.identifier.url	http://dx.doi.org/10.1063/1.4907686
dc.source.beginpage	64101
dc.source.issue	6
dc.source.journal	Journal of Applied Physics
dc.source.volume	117
dc.title	Towards understanding intrinsic degradation and breakdown mechanism of a SiOCH low-k dielectric
dc.type	Journal article
dspace.entity.type	Publication
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