Bright-field EUV mask patterning for extending scaling roadmap

Miyaguchi, Kenichi; Fujimura, Yukihiro; Yamaji, Masataka; Ebisawa, Mei; Hotei, Izumi; Abe, Tsukasa; Tomizuka, Shosuke; Deguchi, Hiroki; Yoshikawa, Shingo; Tan, Ling Ee; Trivkovic, Darko; Sherazi, Yasser; Kim, Ryan Ryoung Han

doi:10.1117/12.3075933

Publication:

Bright-field EUV mask patterning for extending scaling roadmap

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3075933

Simple item page Full metadata Statistics

Author(s)

;

;

;

;

;

;

;

;

;

;

;

;

Journal

PHOTOMASK TECHNOLOGY 2025

Statistics

18 since deposited on 2026-03-31

7last month

4last week

Acq. date: 2026-10-08

Bright-field EUV mask patterning for extending scaling roadmap

Date

Author(s)

Journal

Abstract

Description

Statistics

Views

Citations

Statistics

Views

Citations