Bright-field EUV mask patterning for extending scaling roadmap

Miyaguchi, Kenichi; Fujimura, Yukihiro; Yamaji, Masataka; Ebisawa, Mei; Hotei, Izumi; Abe, Tsukasa; Tomizuka, Shosuke; Deguchi, Hiroki; Yoshikawa, Shingo; Tan, Ling Ee; Trivkovic, Darko; Sherazi, Yasser; Kim, Ryan Ryoung Han

doi:10.1117/12.3075933

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Bright-field EUV mask patterning for extending scaling roadmap

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3075933

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PHOTOMASK TECHNOLOGY 2025

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3 since deposited on 2026-03-31

Acq. date: 2026-04-06

Bright-field EUV mask patterning for extending scaling roadmap

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