Publication:
Bright-field EUV mask patterning for extending scaling roadmap
| dc.contributor.author | Miyaguchi, Kenichi | |
| dc.contributor.author | Fujimura, Yukihiro | |
| dc.contributor.author | Yamaji, Masataka | |
| dc.contributor.author | Ebisawa, Mei | |
| dc.contributor.author | Hotei, Izumi | |
| dc.contributor.author | Abe, Tsukasa | |
| dc.contributor.author | Tomizuka, Shosuke | |
| dc.contributor.author | Deguchi, Hiroki | |
| dc.contributor.author | Yoshikawa, Shingo | |
| dc.contributor.author | Tan, Ling Ee | |
| dc.contributor.author | Trivkovic, Darko | |
| dc.contributor.author | Sherazi, Yasser | |
| dc.contributor.author | Kim, Ryan Ryoung Han | |
| dc.date.accessioned | 2026-03-31T07:17:12Z | |
| dc.date.available | 2026-03-31T07:17:12Z | |
| dc.date.createdwos | 2026-02-20 | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3075933 | |
| dc.identifier.isbn | 978-1-5106-9320-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/58973 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 136870R | |
| dc.source.conference | Photomask Technology | |
| dc.source.conferencedate | 2025-09-22 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | PHOTOMASK TECHNOLOGY 2025 | |
| dc.source.numberofpages | 6 | |
| dc.title | Bright-field EUV mask patterning for extending scaling roadmap | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-02-23 | |
| imec.internal.source | crawler | |
| Files | ||
| Publication available in collections: |