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Linewidth dependence of the reverse bias junction leakage for co-silicided source/drain junctions

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dc.contributor.authorLauwers, Anne
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorChamirian, Oxana
dc.contributor.authorDemeurisse, Caroline
dc.contributor.authorVrancken, Christa
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-14T22:10:41Z
dc.date.available2021-10-14T22:10:41Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6529
dc.source.beginpage29
dc.source.conferenceSilicon Materials - Processing, Characterization, and Reliability
dc.source.conferencedate1/04/2002
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage34
dc.title

Linewidth dependence of the reverse bias junction leakage for co-silicided source/drain junctions

dc.typeProceedings paper
dspace.entity.typePublication
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