Publication:

Oxidation behavior of Ni thin films: application to NiO-based ReRAM

Date

2009
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorLisoni, Judit
dc.contributor.authorGoux, Ludovic
dc.contributor.authorVerleysen, Eveline
dc.contributor.authorWang, Xin Peng
dc.contributor.authorJurczak, Gosia
dc.contributor.authorWouters, Dirk
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.date.accessioned2021-10-18T00:06:36Z
dc.date.available2021-10-18T00:06:36Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15729
dc.source.conferenceMRS Spring Meeting Symposium H: Materials and Physics for Nonvolatile Memories
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Oxidation behavior of Ni thin films: application to NiO-based ReRAM

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions