Publication:

Wafer bevel protection during deep reactive ion etching

Date

2010
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorCharavel, Remy
dc.contributor.authorGassot, Pierre
dc.contributor.authorde Backer, E.
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorDevriendt, Katia
dc.contributor.authorVan Wichelen, Koen
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.date.accessioned2021-10-18T15:31:29Z
dc.date.available2021-10-18T15:31:29Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16841
dc.source.conference13th Technical and Scientific Meeting of ARCSIS : 'Manufacturing Challenges in European Semiconductor Fabs'
dc.source.conferencedate18/11/2010
dc.source.conferencelocationRousset France
dc.title

Wafer bevel protection during deep reactive ion etching

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations