Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Articles
Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma
Publication:
Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma
Date
1998
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
2316.pdf
216.16 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baklanov, Mikhaïl
;
Vanhaelemeersch, Serge
;
Storm, Wolfgang
;
Vandervorst, Wilfried
;
Maex, Karen
Journal
Journal of Vacuum Science and Technology B
Abstract
Description
Metrics
Views
2024
since deposited on 2021-09-30
3
last month
Acq. date: 2025-12-08
Citations
Metrics
Views
2024
since deposited on 2021-09-30
3
last month
Acq. date: 2025-12-08
Citations