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Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma

Date

1998
Journal article
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dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-09-30T11:25:55Z
dc.date.available2021-09-30T11:25:55Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2365
dc.source.beginpage167
dc.source.endpage172
dc.source.issue1
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume16
dc.title

Surface processes occuring on TiSi2 and CoSi2 in fluorine-based plasmas: afterglow of NF3 plasma

dc.typeJournal article
dspace.entity.typePublication
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