Publication:
Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process
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1979 since deposited on 2021-10-16
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Acq. date: 2025-12-08
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1979 since deposited on 2021-10-16
1last month
1last week
Acq. date: 2025-12-08
Citations