Publication:
Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process
Date
| dc.contributor.author | Kang, JinFeng | |
| dc.contributor.author | Yu, HongYu | |
| dc.contributor.author | Ren, C. | |
| dc.contributor.author | Yang, H. | |
| dc.contributor.author | Sa, N. | |
| dc.contributor.author | Liu, X.Y. | |
| dc.contributor.author | Han, R.Q. | |
| dc.contributor.author | Li, M.F. | |
| dc.contributor.author | Chan, D.S.H. | |
| dc.contributor.author | Kwong, D.L. | |
| dc.date.accessioned | 2021-10-16T02:26:44Z | |
| dc.date.available | 2021-10-16T02:26:44Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10676 | |
| dc.source.beginpage | 375 | |
| dc.source.conference | Proceedings of the 35th European Solid-State Device Research Conference - ESSDERC | |
| dc.source.conferencelocation | Grenoble France | |
| dc.source.endpage | 378 | |
| dc.title | Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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