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The black silicon method. VIII. A study of the performance of etching silicon using Sf6/O-2-based chemistry with cryogenical wafer cooling and a high density ICP Source
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1925 since deposited on 2021-10-14
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Acq. date: 2025-10-24
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Views
1925 since deposited on 2021-10-14
446item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations