Publication:
28nm-pitch Ru interconnects patterned with 0.33NA-EUV single exposure
| dc.contributor.author | Das, Sayantan | |
| dc.contributor.author | Kisson, Nicola | |
| dc.contributor.author | Mahmud Ul Hasan, Hasan MD | |
| dc.contributor.author | Rynders, Luc | |
| dc.contributor.author | Kljucar, Luka | |
| dc.contributor.author | Halder, Sandip | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Dusa, Mircea | |
| dc.contributor.author | Rio, David | |
| dc.contributor.author | Mohsen, Mahmoud | |
| dc.contributor.author | Spence, Chris | |
| dc.contributor.author | De Poortere, Etienne | |
| dc.contributor.imecauthor | Das, Sayantan | |
| dc.contributor.imecauthor | Mahmud Ul Hasan, Hasan MD | |
| dc.contributor.imecauthor | Rynders, Luc | |
| dc.contributor.imecauthor | Kljucar, Luka | |
| dc.contributor.imecauthor | Halder, Sandip | |
| dc.contributor.imecauthor | Leray, Philippe | |
| dc.contributor.imecauthor | Dusa, Mircea | |
| dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
| dc.contributor.orcidimec | Leray, Philippe::0000-0002-1086-270X | |
| dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
| dc.date.accessioned | 2022-08-31T08:27:33Z | |
| dc.date.available | 2022-05-22T02:19:15Z | |
| dc.date.available | 2022-06-16T06:40:04Z | |
| dc.date.available | 2022-07-08T08:49:06Z | |
| dc.date.available | 2022-08-05T15:13:27Z | |
| dc.date.available | 2022-08-31T08:27:33Z | |
| dc.date.issued | 2021 | |
| dc.identifier.doi | 10.1117/12.2600937 | |
| dc.identifier.eisbn | 978-1-5106-4553-0 | |
| dc.identifier.isbn | 978-1-5106-4552-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/39874 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 32 | |
| dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | SEP 27-OCT 01, 2021 | |
| dc.source.conferencelocation | Online | |
| dc.source.endpage | 41 | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 10 | |
| dc.source.volume | 11854 | |
| dc.title | 28nm-pitch Ru interconnects patterned with 0.33NA-EUV single exposure | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |