Publication:
Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions
Date
| dc.contributor.author | Shamiryan, Denis | |
| dc.contributor.author | Weidner, K. | |
| dc.contributor.author | Gray, W.D. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-10-14T23:09:03Z | |
| dc.date.available | 2021-10-14T23:09:03Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6821 | |
| dc.source.beginpage | 361 | |
| dc.source.endpage | 366 | |
| dc.source.issue | 1_4 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 64 | |
| dc.title | Comparative study of PECVD SiOCH low-k films obtained at different deposition conditions | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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