Publication:

High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

1929 since deposited on 2021-10-16
2last month
Acq. date: 2026-01-25

Citations

Statistics

Views

1929 since deposited on 2021-10-16
2last month
Acq. date: 2026-01-25

Citations