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High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric
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High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric
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Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wang, X.P.
;
Li, M.F.
;
Yu, HongYu
;
Yang, J.J.
;
Loh, W.Y.
;
Zhu, C.X.
;
Du, A.Y.
;
Trigg, A.D.
;
Zhang, G.
;
Sik, H.W.
;
Ren, C.
;
Lim, Andy
;
Lee, Rinus
;
Yu, X.F.
;
Chen, J.D.
;
Chin, Albert
;
Yeo, Y.C.
;
Biesemans, Serge
;
Chua, T.C.
;
Nouri, F.
;
Lo, Patrick
;
Kwong, D.L.
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1929
since deposited on 2021-10-16
2
last month
Acq. date: 2026-01-25
Citations