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High performance & CMOS integration friendly dual metal gate MOSFETs using TaN/Ru or TaN/W/Ru stacking multi-layers on HfLaO gate dielectric

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1930 since deposited on 2021-10-16
1last month
Acq. date: 2026-05-19

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Views

1930 since deposited on 2021-10-16
1last month
Acq. date: 2026-05-19

Citations