Publication:
Atomic-layer-deposited tantalum silicate as a gate dielectric for III-V MOS devices
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1931 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-12
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Views
1931 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-12
Citations