Publication:

Processing Stability of Monolayer WS2 on SiO2

Date

2021
Journal article
https://doi.org/10.1088/2632-959X/ac022b
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Author(s)

Delie, G.
;
Chiappe, D.
;
Asselberghs, Inge  
;
Huyghebaert, Cedric  
;
Radu, Iuliana  
;
Banerjee, Sreetama  
;
Groven, Benjamin  
;
Brems, Steven  
;
Afanas'ev, V. V.

Journal

NANO EXPRESS

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162 since deposited on 2021-11-02
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1671 since deposited on 2021-11-02
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