Publication:

Processing Stability of Monolayer WS2 on SiO2

Date

2021
Journal article
https://doi.org/10.1088/2632-959X/ac022b
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dc.contributor.authorDelie, G.
dc.contributor.authorChiappe, D.
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorRadu, Iuliana
dc.contributor.authorBanerjee, Sreetama
dc.contributor.authorGroven, Benjamin
dc.contributor.authorBrems, Steven
dc.contributor.authorAfanas'ev, V. V.
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorBanerjee, Sreetama
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorBrems, Steven
dc.contributor.orcidextAfanas'ev, V. V.::0000-0001-5018-4539
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecBanerjee, Sreetama::0000-0002-6297-9547
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.date.accessioned2022-06-14T11:01:11Z
dc.date.available2021-11-02T16:01:31Z
dc.date.available2022-05-30T08:31:28Z
dc.date.available2022-06-14T11:01:11Z
dc.date.issued2021
dc.identifier.doi10.1088/2632-959X/ac022b
dc.identifier.issn2632-959X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37908
dc.publisherIOP PUBLISHING LTD
dc.source.beginpage024004
dc.source.issue2
dc.source.journalNANO EXPRESS
dc.source.numberofpages8
dc.source.volume2
dc.subject.keywordsINTERNAL PHOTOEMISSION
dc.subject.keywordsSINGLE-LAYER
dc.subject.keywordsMOS2
dc.subject.keywordsTRANSISTOR
dc.subject.keywordsSAPPHIRE
dc.subject.keywordsMOBILITY
dc.title

Processing Stability of Monolayer WS2 on SiO2

dc.typeJournal article
dspace.entity.typePublication
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