Surface properties restoration and passivation of high porosity ultra low-k dielectric (k~2.3) after direct-CMP

dc.contributor.author	Sinapi, Fabrice
dc.contributor.author	Heylen, Nancy
dc.contributor.author	Travaly, Youssef
dc.contributor.author	Vereecke, Guy
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	Kesters, Els
dc.contributor.author	Van Hoeymissen, Jan
dc.contributor.author	Hernandez, Jose Luis
dc.contributor.author	Beyer, Gerald
dc.contributor.author	Fisher, P.
dc.contributor.imecauthor	Heylen, Nancy
dc.contributor.imecauthor	Vereecke, Guy
dc.contributor.imecauthor	Kesters, Els
dc.contributor.imecauthor	Hernandez, Jose Luis
dc.contributor.imecauthor	Beyer, Gerald
dc.contributor.orcidimec	Vereecke, Guy::0000-0001-9058-9338
dc.date.accessioned	2021-10-16T19:48:21Z
dc.date.available	2021-10-16T19:48:21Z
dc.date.issued	2007
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/12912
dc.source.beginpage	2620
dc.source.endpage	2623
dc.source.issue	11
dc.source.journal	Microelectronic Engineering
dc.source.volume	84
dc.title	Surface properties restoration and passivation of high porosity ultra low-k dielectric (k~2.3) after direct-CMP
dc.type	Journal article
dspace.entity.type	Publication
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