Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration
Publication:
I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration
Copy permalink
Date
2015
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
31536.pdf
696.37 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ritzenthaler, Romain
;
Schram, Tom
;
Cho, Moon Ju
;
Mocuta, Anda
;
Horiguchi, Naoto
;
Thean, Aaron
;
Spessot, Alessio
;
Caillat, Christian
;
Aoulaiche, Marc
;
Fazan, Pierre
;
Noh, Kyung Bong
;
Son, Yunik
Journal
Abstract
Description
Metrics
Views
2110
since deposited on 2021-10-22
3
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
2110
since deposited on 2021-10-22
3
last month
Acq. date: 2025-12-10
Citations