Publication:

I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration

Date

2015
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorSchram, Tom
dc.contributor.authorCho, Moon Ju
dc.contributor.authorMocuta, Anda
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.contributor.authorSpessot, Alessio
dc.contributor.authorCaillat, Christian
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorFazan, Pierre
dc.contributor.authorNoh, Kyung Bong
dc.contributor.authorSon, Yunik
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorFazan, Pierre
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-22T22:17:13Z
dc.date.available2021-10-22T22:17:13Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25824
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7165908
dc.source.beginpage1
dc.source.conferenceInternational Conference on IC Design and Technology - ICICDT
dc.source.conferencedate1/06/2015
dc.source.conferencelocationLeuven Belgium
dc.source.endpage4
dc.title

I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
31536.pdf
Size:
696.37 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions