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Evaluation of barrier integrity on ultra low-k films with different porosities

Date

2013
Meeting abstract
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dc.contributor.authorWang, Cong
dc.contributor.authorVan Besien, Els
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVerdonck, Patrick
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned2021-10-21T14:26:00Z
dc.date.available2021-10-21T14:26:00Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23373
dc.source.beginpageAA6.05
dc.source.conferenceMRS Spring Meeting Sympiosium AA: Advanced Interconnects for Micro- and Nanoelectronics-Materials, Processes, and Reliability
dc.source.conferencedate1/04/2012
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Evaluation of barrier integrity on ultra low-k films with different porosities

dc.typeMeeting abstract
dspace.entity.typePublication
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