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Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications, using RELACS shrink and corresponding OPC
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Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications, using RELACS shrink and corresponding OPC
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Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Op de Beeck, Maaike
;
Versluijs, Janko
;
Wiaux, Vincent
;
Vandeweyer, Tom
;
Ciofi, Ivan
;
Struyf, Herbert
;
Hendrickx, Dirk
;
Van Olmen, Jan
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1910
since deposited on 2021-10-16
Acq. date: 2025-12-15
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Views
1910
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations