Publication:

Ultra thin gate oxide technology and reliability

Date

1996
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorHeyns, Marc
dc.contributor.authorDepas, Michel
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorMouche, Laurent
dc.contributor.authorNigam, Tanya
dc.contributor.authorWilhelm, Rudi
dc.contributor.authorKnotter, Martin
dc.contributor.authorWolke, K.
dc.contributor.authorCrossley, A.
dc.contributor.authorSofield, C. J.
dc.contributor.authorGräf, D.
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T14:33:57Z
dc.date.available2021-09-29T14:33:57Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1260
dc.source.beginpage208
dc.source.conferenceProceedings 5th International Symposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate2/10/1996
dc.source.conferencelocationTokyo Japan
dc.source.endpage211
dc.title

Ultra thin gate oxide technology and reliability

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
1235.pdf
Size:
209.44 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions