Publication:

Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography

Date

2021
Journal article
https://doi.org/10.1117/1.JMM.20.3.034602
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dc.contributor.authorRathore, Ashish
dc.contributor.authorPollentier, Ivan
dc.contributor.authorKumar, Sunkuru S.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorRathore, Ashish
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2023-01-19T13:57:26Z
dc.date.available2021-11-02T15:55:45Z
dc.date.available2023-01-19T13:57:26Z
dc.date.embargo2022-12-31
dc.date.issued2021
dc.identifier.doi10.1117/1.JMM.20.3.034602
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37470
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage034602
dc.source.endpagena
dc.source.issue3
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages8
dc.source.volume20
dc.subject.keywordsRESIST MATERIALS
dc.subject.keywordsDESIGN
dc.title

Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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