Publication:
HfO2, Al2O3 and HfAlOx high-k dielectrics characterized by VUV spectroscopic ellipsometry
Date
| dc.contributor.author | Boher, P. | |
| dc.contributor.author | Defranaoux, C. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.date.accessioned | 2021-10-15T04:02:47Z | |
| dc.date.available | 2021-10-15T04:02:47Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7235 | |
| dc.source.conference | MRS Spring Meeting Symposium D: CMOS Front-End Materials and Process Technology, Materials Research Society, MRS Spring Meeting | |
| dc.source.conferencedate | 21/04/2003 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | HfO2, Al2O3 and HfAlOx high-k dielectrics characterized by VUV spectroscopic ellipsometry | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
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