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Active area patterning for CFET - Nanosheet etch

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dc.contributor.authorBrissonneau, Vincent
dc.contributor.authorKoo, Il Gyo
dc.contributor.authorHosseini, Maryam
dc.contributor.authorBatuk, Dmitry
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMannaert, Geert
dc.contributor.authorLazzarino, Frederic
dc.contributor.imecauthorKoo, Il Gyo
dc.contributor.imecauthorBrissonneau, Vincent
dc.contributor.imecauthorHosseini, Maryam
dc.contributor.imecauthorBatuk, Dmitry
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecKoo, Il Gyo::0009-0009-4534-2980
dc.contributor.orcidimecBrissonneau, Vincent::0000-0002-9054-4591
dc.contributor.orcidimecHosseini, Maryam::0000-0002-0210-4095
dc.contributor.orcidimecBatuk, Dmitry::0000-0002-6384-6690
dc.contributor.orcidimecMannaert, Geert::0009-0003-1267-5355
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2024-08-08T12:46:13Z
dc.date.available2024-06-06T18:30:24Z
dc.date.available2024-08-08T12:46:13Z
dc.date.embargo2024-04-09
dc.date.issued2024
dc.identifier.doi10.1117/12.3012322
dc.identifier.eisbn978-1-5106-7223-9
dc.identifier.isbn978-1-5106-7222-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43988
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 1295804
dc.source.conferenceConference on Advanced Etch Technology and Process Integration for Nanopatterning XIII
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.endpageN/A
dc.source.journalProceedings of SPIE
dc.source.numberofpages5
dc.source.volume12958
dc.title

Active area patterning for CFET - Nanosheet etch

dc.typeProceedings paper
dspace.entity.typePublication
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